专利名称:HEAT DISSIPATION STRUCTURE FOR
ELECTRONIC DEVICE AND FABRICATIONMETHOD THEREOF
发明人:Ra-Min Tain,Ming-Ji Dai,Yon-Hua Tzeng申请号:US13332144申请日:20111220
公开号:US20120092834A1公开日:20120419
专利附图:
摘要:A heat dissipation structure for an electronic device includes a body having afirst surface and a second surface opposite to the first surface. A silicon-containing
insulating layer is disposed on the first surface of the body. A chemical vapor deposition(CVD) diamond film is disposed on the silicon-containing insulating layer. A first
conductive pattern layer is disposed on the silicon-containing insulating layer, wherein thefirst conductive pattern layer is enclosed by and spaced apart from the CVD diamondfilm. A method for fabricating a heat dissipation structure for an electronic device and anelectronic package having the heat dissipation structure are also disclosed.
申请人:Ra-Min Tain,Ming-Ji Dai,Yon-Hua Tzeng
地址:New Taipei City TW,Hsinchu City TW,Changhua County TW
国籍:TW,TW,TW
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