COATING COMPOSITION, AND PROCESS FOR PRODUCING PHO

专利名称：COATING COMPOSITION, AND PROCESS

FOR PRODUCING PHOTORESIST LAMINATE

发明人：Ryujiro YAMASAKI,Masahiro Ito,Yoshihiko

Sakane

申请号：US15454021申请日：20170309

公开号：US20170307975A1公开日：20171026

摘要：A coating composition which contains a fluorinated polymer having a unit (1)represented by —[CXX—CY(Rf—COOM)]— and a fluorinated compound represented byCXX═CY(Rf—COOM), wherein the content of the fluorinated compound is from 0.1 to 8.0parts by mass per 100 parts by mass of the fluorinated polymer. X, X, Xand Xare H, F orCl, Yand Yare H, F, Cl, a methyl group or a trifluoromethyl group, Rfand Rfare aperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or an oxyperfluoroalkylene group which may contain an etheric oxygenatom between carbon-carbon atoms, —COOMis —COOH or —COOZ, and —COOMis —COOH or —COOZ(wherein Zand Zare an ammonium ion in which the hydrogen atom maybe substituted). The coating composition is suitable for forming a thin antireflectioncoating layer without increasing its refractive index.

申请人：Asahi Glass Company, Limited

地址：Chiyoda-ku JP

国籍：JP

更多信息请下载全文后查看