Stage design for reflective optics
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专利名称：Stage design for reflective optics发明人：Andrew J. Hazelton申请号：US11031372申请日：20050106公开号：US07193683B2公开日：20070320
专利附图：
摘要：A lithography apparatus including a reticle stage, a wafer stage, and an actuator.The reticle stage is operable to project an original image. A final image corresponding tothe original image is formed on the wafer stage. The actuator is operable to actuate thereticle stage at a first acceleration and the wafer stage at a second acceleration. The first
acceleration and the second acceleration are in colinear and opposite directions.
申请人：Andrew J. Hazelton
地址：Yokohama JP
国籍：JP
代理机构：Beyer Weaver LLP
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